Call 800-713-9375

Order!

Thermal Oxide or Silicon Dioxide (SiO2)

is the insulating layer commonly used in semiconductors.

We grow our insulating oxide layer using Wet and Dry Oxide methods.

 

Wet Oxide is the less expensive of the two options and is grown on both sides of the wafer by default.

Clients how need the wet oxide on just one side of the wafer can request us to back-grind oxide off one side of the wafer.

This is usually the etched side.

 

Dry Oxide is more expensive than wet but you can grow the oxide on just one side of the wafer.  This reduces

yield issues with back-grinding the wet oxide off one side of the wafer.

Fill out the Form Below for a Fast Quote!

Submitting Form...

The server encountered an error.

Form received.

Below are just some of our Thermal Oxide Wafers.

 

50.8mm P/B (100)1-10 ohm-cm 280um SSP $7.90 each

With 300nm of Oxide $16.90 each

with 100nm of LPCVD Nitride $31.90 each

 

100mm N/Ph (100) 1-10 ohm-cm 500um SSP $12.90 each

with 300nm of oxide $20.90 each

with 100nm of LPCVD Nitride $36.90 each

 

100mm N/As  (100) 0.001-0.005 ohm-cm 500um SSP $14.90 each

with 300nm of oxide $22.90 each

with 100nm of LPCVD Nitride $38.90 each

 

100mm P/B  (100) 1-10 ohm-cm 500um SSP $12.50 each

with 300nm of oxide $20.50 each

with 100nm of LPCVD Nitride $36.90 each

 

100mm P/B  (100) 0.001-0.005 ohm-cm 500um SSP $13.90 each

with 300nm of oxide $21.90 each

with 100nm of LPCVD Nitride $37.90 each

 

100mm P/B  (100) 1-20 ohm-cm 1,00um SSP $15.90 each

with 300nm of oxide $23.90 each

with 100nm of LPCVD Nitride $39.90 each

 

100mm P/B  (100) 0.01-0.02 ohm-cm 525um SSP $13.90 each

with 300nm of oxide $21.90 each

with 100nm of LPCVD Nitride $39.90 each